The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 1990
Filed:
Oct. 06, 1988
Isao Fukui, Uji, JP;
Koji Okada, Kyoto, JP;
Shimadzu Corporation, Kyoto, JP;
Abstract
An analyzing method of an Inductively-Coupled Radio Frequency Plasma (ICP) apparatus including a switch valve means for switching the flow of a sample which comprises the steps of: first switching the switch valve to the side of a plasma torch only during an ICP analyzing time; first supplying an induction coil a first radio frequency electric power and the plasma torch first volume of gas to cause plasma; analyzing the plasma; second switching the switch valve to an exit side of the sample during the times except for the ICP analyzing time; and second supplying the induction coil a second radio frequency electric power and the plasma torch second volume of gas to keep pilot light plasma, and an apparatus for use in such method; whereby the plasma is maintained at a condition of a pilot light except for analyzing, and a running cost is reduced.