The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 27, 1990

Filed:

Dec. 04, 1987
Applicant:
Inventors:

Jiro Tokita, Kokubunji, JP;

Keiichi Nagai, Higashiyamato, JP;

Tamotu Simada, Akishima, JP;

Ken'ichi Watanabe, Kudamatsu, JP;

Ryusei Nakano, Kokubunji, JP;

Tomoaki Sumitani, Hachioji, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C25B / ;
U.S. Cl.
CPC ...
2042 / ; 2041828 ;
Abstract

In the instrument for determination of the base sequence of the present invention, the ionic strength of a buffer solution in a gel is made lower at a detection part than in a region from the detection part towards a negative electrode. Therefore, at the detection part, the electric field intensity can be increased, resulting in a higher migration speed, and hence the electrophoretic pattern can be extended, so that the distance between two adjacent electrophoretic bands can be elongated. Consequently, according to the present invention, the slit width can be narrowed relatively to the electrophoretic pattern without actually narrowing the slit width, and the resolving power can be enhanced without lowering the detection sensitivity.


Find Patent Forward Citations

Loading…