The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 20, 1990

Filed:

Apr. 27, 1988
Applicant:
Inventors:

Masaya Okamoto, Ichihara, JP;

Eiichi Terada, Ichihara, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08K / ; C08G / ;
U.S. Cl.
CPC ...
524151 ; 524141 ; 524145 ; 524147 ; 525394 ; 525462 ; 528196 ; 528204 ;
Abstract

High impact resistant polycarbonate, a process for producing said polycarbonate, and a polycarbonate resin composition are disclosed. This polycarbonate consists of a main chain with a cumylphenoxy group, as a terminal group, bonded to at least one end thereof, said main chain comprising a repeating unit represented by the formula (I): ##STR1## and has a viscosity average molecular weight of at least 10,000 and an acetone soluble content of not more than 3.5 wt %. The polycarbonate can be efficiently produced by the process of the invention. The composition comprises a polycarbonate resin and a specific amount of a phosphorus-based antioxidant.


Find Patent Forward Citations

Okamoto, Masaya. (1990). High impact resistant polycarbonate and process for producing said (U.S. Patent No. 4902735). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4902735

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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