The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 1990
Filed:
Mar. 06, 1989
Charles F Brucker, San Diego, CA (US);
Frederick E Spada, San Diego, CA (US);
Other;
Abstract
A 3,000-10,000 angstrom thick cobalt-platinum (CoPt) magnetic film is deposited onto a chromium (Cr) or tungsten (W) overlayer on a substrate, or is deposited directly onto the substrate. The deposited film has an appreciable component of its C-axis, which is parallel to the [00.2] direction, lying in the plane of the film. The component of the C-axis lies in the plane of the film throughout the entire thickness of the CoPt film, and the resultant magnetic film has a coercivity from 1,300-2,000 oersteds, depending upon which, if any, overlayer is included. The method for producing the magnetic film of the invention teaches sputtering the overlayer onto a substrate maintained approximately at room temperature in an atmosphere of inert gas. After ajdusting the pressure of the gas and controlling the distance between the CoPt sputtering target and the substrate, CoPt is sputtered such that the depositing Co and Pt atoms are thermalized while traversing the distance between the target and the substrate. The film as deposited is magnetically isotropic in the plane, and may configured as a permanent magnet having a resultant magnetization in the plane by exposure to an external magnetizing field oriented along the film plane.