The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 1990
Filed:
Apr. 12, 1989
Applicant:
Inventors:
Assignee:
Ushio Denki, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F / ; H01L / ;
U.S. Cl.
CPC ...
2504422 ; 2504921 ;
Abstract
A method of treating positive photoresist materials applied on a semiconductor wafer placed on a support, which meets the demand for high-speed treatment and improvement in heat-resistance and plasma-resistance of the developed positive photoresist image. The developed positive photoresist image is exposed to radiant lights including ultraviolet rays in an chamber filled with gas in which oxygen and/or moisture are reduced or not included.
Suzuki, Shinji. (1990). Method of treating photoresists (U.S. Patent No. 4900938). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4900938
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