The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 06, 1990
Filed:
Jul. 05, 1988
Applicant:
Inventors:
Hans-Peter Stormberg, Stolberg, DE;
Yoshio Watanabe, Tokyo, JP;
Assignees:
U.S. Philips Corporation, New York, NY (US);
Hitachi Ltd., , US;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K / ;
U.S. Cl.
CPC ...
378 34 ; 378122 ;
Abstract
An X-ray lithography system comprises an X-ray source which forms a plasma, a band slit located between the X-ray source and a resist film such that a short slit side is parallel with a central axis of a plasma column, the long slit side being tilted with respect to said central plasma column axis.
Quick Actions:
Stormberg, Hans-Peter. (1990). X-ray lithography system (U.S. Patent No. 4899355). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4899355
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile