The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 06, 1990
Filed:
Oct. 06, 1988
Applicant:
Inventors:
Seizo Yabe, Tokyo, JP;
Kunio Yamazaki, Osaka, JP;
Assignee:
Mitsubishi Gas Chemical Company, Inc., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C / ;
U.S. Cl.
CPC ...
264266 ; 264132 ; 264247 ; 264259 ;
Abstract
A process for producing a synthetic resin molded article having a pattern formed on its uneven surface, which comprises fitting a patterned film or sheet to a mold and injecting a thermoplastic resin, wherein said mold has engraved therein such an unevenness that said patterned film or sheet undergoes extension of from 5 to 120% upon resin injection, and said patterned film or sheet is a polycarbonate film or sheet having a thickness of from 0.1 to 1 mm. The resulting molded article has a clearly outlined pattern on the uneven surface.