The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 30, 1990
Filed:
Apr. 24, 1989
Applicant:
Inventors:
Herbert S Cole, Scotia, NY (US);
James E Kohl, Schenectady, NY (US);
Assignee:
General Electric Company, Schenectady, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; C03C / ; B29C / ; B32B / ;
U.S. Cl.
CPC ...
156643 ; 134-1 ; 134-3 ; 156629 ; 156633 ; 156644 ; 156646 ; 156651 ; 156655 ; 156668 ; 1562726 ; 1562728 ; 20419236 ; 21912169 ; 21912185 ; 427 38 ; 427307 ; 427309 ;
Abstract
A method of forming a multilayer metallization pattern using siloxane polyimide dielectric layers comprises forming the first siloxane polyimide layer, laser etching holes in the first layer, plasma etching the first layer to be sure the holes are clean, then cleaning the surface of the first layer in an etchant for silicon oxide, after which the metallization layer is formed and patterned and a second siloxane polyimide layer is formed thereover with good adhesion.