The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 30, 1990
Filed:
Jun. 29, 1988
Applicant:
Inventors:
Daniel J Dooley, Saratoga, CA (US);
Arthur R Elsea, Jr, Freemont, CA (US);
Assignee:
Lasa Industries, Inc., San Jose, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; B44C / ; C03C / ; C03C / ;
U.S. Cl.
CPC ...
156628 ; 156643 ; 156657 ; 156662 ; 21912185 ; 357 65 ; 357 71 ; 437192 ; 437193 ; 437233 ; 437248 ; 437967 ;
Abstract
An improved method of patterning a conductive interconnect on a semiconductor element is disclosed. A catalytic layer of, for example, amorphous silicon is deposited on a semiconductor element. The areas over which a conductive pattern is to be formed is activated by directing a focused laser beam onto the amorphous silicon to form crystallized silicon. The amorphous silicon is then etched away after which a conductive material such as a metal is deposited on the activated crystallized silicon.