The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 1990
Filed:
May. 25, 1988
Katsue Koashi, Toyonaka, JP;
Yosuke Eguchi, Takatsuki, JP;
Kurashiki Boseki Kabushiki Kaisha, Okayama, JP;
Abstract
An apparatus for measuring the thickness of a thin film utilizing an interferometric method includes a light source for generating a monochromatic light beam, a scanner for scanning the light beam on a thin film in such a manner that an incident angle thereto is continuously varied from .alpha. to (-.alpha.), a first detector for detecting the incident angle of the light beam and a second detector for detecting an interference pattern caused by light beams reflected from the top and bottom surfaces of the thin film. The thickness of the thin film is obtained in accordance with a geometrical optical relationship defined between adjacent fringes contained in the detected interference pattern.