The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 1990
Filed:
Dec. 27, 1988
Applicant:
Inventors:
Noboru Motai, Tochigi, JP;
Sakae Tanaka, Tokyo, JP;
Yoshiaki Watanabe, Tokyo, JP;
Katsuo Shirai, Tochigi, JP;
Yaeko Suzuki, Tochigi, JP;
Yoshihisa Ogiwara, Tochigi, JP;
Kazunori Saito, Tochigi, JP;
Keiko Shibuki, Tochigi, JP;
Assignees:
Nippon Precision Circuits Ltd., Tokyo, JP;
Seikosha Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F / ; H01L / ; B44C / ; C03C / ;
U.S. Cl.
CPC ...
156643 ; 156651 ; 156656 ; 156657 ; 1566591 ; 156662 ; 156904 ; 20419237 ;
Abstract
A light shielding thin film is provided on a light transmitting substrate, and the film is covered by a photoresist. The photoresist is exposed and developed to form a pattern, and the film is etched using the pattern as a mask. The pattern is then exposed through the substrate, using the film as a mask, the pattern then being developed to form a pattern of reduced size. The film is then etched using the reduced size pattern as a mask.