The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 1990
Filed:
Mar. 25, 1986
Applicant:
Inventors:
Norio Shimizu, Hitachi, JP;
Shinichi Fukuzono, Hitachi, JP;
Nobuko Nishimura, Katsuta, JP;
Yoji Odawara, Hitachi, JP;
Tomoaki Sumitani, Hachiooji, JP;
Assignee:
Hitachi, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C12Q / ;
U.S. Cl.
CPC ...
435-3 ; 4352401 ; 4352402 ; 435243 ; 435244 ; 4352523 ; 43525233 ; 43525231 ;
Abstract
A method of controlling culture wherein cells are aerobically cultured to produce metabolite is characterized by adding substrate and/or inducer to the culture broth, judging the endpoint of the growth of the cells and/or the production of the metabolite or terminating the culture under the guidance of a change in the ratio of the first parameter based on the amount of carbon dioxide evolved by the cell culture to the second parameter based on the amount of oxygen consumed by the cell culture. The ratio is a respiratory quotient, for instance.