The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 1990
Filed:
Nov. 14, 1988
Applicant:
Inventors:
Shigeki Yokoyama, Kanagawa, JP;
Yukio Maekawa, Kanagawa, JP;
Assignee:
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430527 ; 430528 ; 430529 ; 430631 ; 430634 ;
Abstract
A static-inhibited photographic light-sensitive material is provided by incorporating a fluorine-containing block polymer derived from a polymerizable hydrophobic monomer containing at least one fluorine atom and a polymerizable hydrophilic monomer, as an antistatic agent in at least one layer thereof. Unlike known antistatic agents and methods, the use of the above antistatic agent does not adversely affect the photographic characteristics, antitack property, marring resistance, etc., of the photographic light-sensitive material.