The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 1990
Filed:
Jan. 13, 1986
Applicant:
Inventor:
Lubomir L Jastrzebski, Plainsboro, NJ (US);
Assignee:
General Electric Company, Schenectady, NY (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C30B / ;
U.S. Cl.
CPC ...
156610 ; 156612 ; 156613 ; 156614 ; 156D / ; 156D / ;
Abstract
A mask of insulating material is formed on the major surface of a semiconductor wafer, the mask including apertures to the wafer surface. A layer of monocrystalline silicon is then formed through the apertures and over the mask. The silicon within each aperture is next replaced with an insulating plug and epitaxial silicon is grown from the remaining portions of the monocrystalline silicon layer so as to form a continuous monocrystalline silicon sheet overlying the mask and plug.