The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 1990
Filed:
Jun. 14, 1988
Vinod K Sarin, Lexington, MA (US);
Charles D'Angelo, Southboro, MA (US);
Helen E Rebenne, Westboro, MA (US);
GTE Laboratories Incorporated, Waltham, MA (US);
Abstract
A CVD apparatus including an internal reactor for in-situ generation of source gases for the CVD reaction. The internal reactor comprises a shell for containing solid precursor material, inlet and outlet means for a precursor gas and the gaseous product respectively, and preferably gas distribution means and means for preventing entrainment of the solid precursor in the gas flow. The internal reactor is positioned within the CVD reactor to provide the optimum temperature for the reaction taking place within the internal reactor.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile