The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 26, 1989
Filed:
Jan. 25, 1988
Junichi Nishimae, Hyogo, JP;
Kenji Yoshizawa, Hyogo, JP;
Masakazu Taki, Hyogo, JP;
Yoshihiro Ueda, Hyogo, JP;
Tadashi Yanagi, Hyogo, JP;
Akihiko Iwata, Hyogo, JP;
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
The invention relates to a plasma apparatus where plasma is generated utilizing microwave discharge and laser excitation is performed and plasma processing is performed. More specifically, in a plasma apparatus where a microwave from a microwave oscillator is transmitted through a microwave transmission path to a microwave circuit, and plasma is generated by a microwave discharge within the microwave circuit, a plasma generating medium for generating the plasma is filled in a space formed between a conductor wall constituting a part of the microwave circuit and a dielectric installed opposite to the conductor wall, and the microwave circuit forms microwave mode having an electric field component orthogonal to the boundary between the dielectric and the plasma.