The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 26, 1989

Filed:

Jan. 31, 1989
Applicant:
Inventors:

Shozo Tsuchiya, Tokyo, JP;

Nobuo Aoki, Yokohama, JP;

Shinichiro Suzuki, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ; G03C / ;
U.S. Cl.
CPC ...
430270 ; 430921 ; 430923 ; 525353 ;
Abstract

A positive type photoresist material comprises a polymer having structural units each represented by the following formula (I) of; ##STR1## wherein each of R.sup.1, R.sup.2, R.sup.3 and R.sup.6 represents a hydrogen atom or a hydrocarbon residue having 1 to 12 carbon atoms, each or R.sup.4 and R.sup.5 represents a hydrogen atom, a hydroxyl group or a hydrocarbon residue having 1 to 12 carbon atoms and Z represents--CH.sub.2 --.sub.n which n indicates an integer of 0 to 4.


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