The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 26, 1989
Filed:
Sep. 06, 1988
Vincent D Cannella, Birmingham, MI (US);
Ovonic Imaging Systems, Inc., Troy, MI (US);
Abstract
A system and method for dry etching an etchable material from a substrate, are disclosed. The system includes an etching chamber including means for establishing a dry etching process therein, a substrate chamber for storing the substrate, and transport means for advancing the substrate from the substrate chamber to the etching chamber. First coupling means couple the interior of the substrate chamber to the interior of the etching chamber to provide an opened passageway therebetween during the etching process. The transport means preferably continuously advances the substrate from the substrate chamber to the etching chamber. Also disclosed are means for maintaining unidirectional gas flow from the substrate chamber to the etching chamber to isolate the etching process from the substrate chamber.