The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 26, 1989

Filed:

Sep. 02, 1988
Applicant:
Inventor:

Kurt H Buschow, Eindhoven, NL;

Assignee:

U.S. Philips Corporation, New York, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
20419215 ; 2041922 ; 20419223 ;
Abstract

A method of producing thin magnetic layers is described. The material composition is defined by the formula REFe.sub.12-x T.sub.x, wherein RE is an element chosen from the set formed by Nd, Sm, Gd, Tb, Dy, Ho, Er, Tm, Lu and Y, wherein T is an element chosen from the set formed by Si, Ti, V, Cr, Mo and W, and wherein 1.ltoreq.x.ltoreq.4. This material is applied by means of a deposition technique from the vapor phase.


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