The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 26, 1989
Filed:
Nov. 22, 1988
Kazushi Kawakami, Okayama, JP;
Tazmo Co., Ltd., , JP;
Abstract
This invention relates to a coating equipment to be used for coating a coating solution (coating diffusion agent, photo-resist agent, etc.) on a film which forms patterns of photo mask substrates (hereinafter merely called 'substrates') used for production of reticle and photo masks or of glass substrates used for liquid crystal display. It features that said coating equipment comprises of a substrate table (spin head) having vacuum suction holes to set and fix said substrates being formed on the upper part of the spindle, a vessel for wrapping said spin head consisting of a vessel body having a peripheral side wall of a certain fixed height and its coverlid means, and both said vessel body and coverlid being able to be separated, a plurality of small holes and tubes being provided at the lower part of said peripheral side wall with a prompt interval, a doughnut-like cup being arranged and placed so that said doughnut-like cut can wrap said vessel of the above structure inside the center portion of said cup, an air suction hole whose height is a little larger than the outer diameter of said small holes or tubes being drilled and provided on the internal periphery of said cup, and the bottom portion of said cup being interconnected to a pipe furnished with an exhaust fan.