The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 19, 1989
Filed:
Nov. 03, 1988
Sharp Kabushiki Kaisha, Osaka, JP;
Abstract
A semiconductor IC element is three-dimensionally structured with a first active layer formed on a single crystalline silicon substrate and a second active layer formed by melting polycrystalline silicon by irradiation on an insulative layer which electrically insulates it from the first layer. Each active layer is comprised of single crystalline areas where transistors may be formed and separation areas which insulate them. PMOS, NMOS or CMOS field effective transistors are formed on these active element areas. A test circuit for testing the originally intended functions of the element as well as its redundant circuits may be formed on these layers. Throughholes are provided to connect the vertically separated active layers.