The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 19, 1989
Filed:
May. 05, 1988
Applicant:
Inventors:
Richard W Adams, Tewksbury, MA (US);
Wen-Cheng J Wei, Jamaica Plain, MA (US);
Assignee:
Ceramics Process Systems Corporation, Milford, MA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C04B / ;
U.S. Cl.
CPC ...
501103 ; 501102 ; 501106 ; 264 60 ;
Abstract
A refractory article and a process for making the same are provided. The article is derived from dissociated zircon and zirconia (99:1 to 80:20, weight basis). These components are formed into a slip, which can be conventionally processed to provide a sintered article. The resulting article can be subsequently heat treated to react any resulting glass phase with the zirconia present; further, the heat treated article can be subsequently redensified. These refractories are well-suited for such applications as tundish nozzle inserts and sliding gate valves.