The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 19, 1989
Filed:
Nov. 13, 1987
Applicant:
Inventors:
Mordechai Rothschild, Newton, MA (US);
Jerry G Black, Lincoln, MA (US);
Daniel J Ehrlich, Lexington, MA (US);
Assignee:
Massachusetts Institute of Technology, Cambridge, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ; B05D / ;
U.S. Cl.
CPC ...
427 534 ; 4271263 ; 4271264 ; 4271265 ; 427256 ; 427261 ; 427262 ; 427301 ; 427322 ; 4271192 ;
Abstract
Thin films (e.g. less than 100 nm thick) of a metal oxide material can be deposited on a variety of hydrophilic substrates by hydrolysis. Deposition is achieved by reacting a vapor of an appropriate metal-containing compound with water at or near the substrate's surface. The resulting deposited film can serve a variety of uses, for example, as a photo-resist in micro-electronics or in any area where protective films are useful, such as the passivation of ternary metal oxide superconductors.