The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 12, 1989

Filed:

May. 20, 1988
Applicant:
Inventors:

Friedrich Anderle, Hanau am Main, DE;

Dan L Costescu, Hainburg, DE;

Stefan Kempf, Alzenau, DE;

Emmerich Novak, Obertshausen, DE;

Jaroslav Zejda, Rodenbach, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
204298 ; 118719 ; 118721 ; 118730 ; 414221 ; 414223 ;
Abstract

A rotatable substrate holder (6) which has a plurality of substrate pickups in a circular arrangement at equal distances apart is disposed in a vacuum chamber (1). A corresponding number of substrates are driven stepwise on a circular path from an air lock station (8, 9) through at least one coating station (10, 11) to the air lock station. To increase the throughput of substrates, the vacuum chamber (1) has two air lock stations (8, 9) and two coating stations (10, 11) one following the other. The step size of the drive (36) on the one hand, and the angular position of each coating station (10 and 11, respectively) with respect to the air lock station associated with it (8 and 9, respectively) with reference to the axis of rotation of the substrate holder (6) on the other hand, are selected such that one and the same coating station (10 and 11, respectively), through the step-wise movement of a particular substrate pickup (63), is associated in each case with one and the same air lock station (8 and 9, respectively).


Find Patent Forward Citations

Loading…