The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 12, 1989

Filed:

Sep. 09, 1988
Applicant:
Inventors:

Mark R Jaworowski, Enfield, CT (US);

Gary A Gruver, South Windsor, CT (US);

Assignee:

United Technologies Corporation, Hartford, CT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23G / ; C23G / ; C23G / ; C23G / ;
U.S. Cl.
CPC ...
134 27 ; 134 28 ; 134 41 ; 204 / ; 204434 ;
Abstract

A method for simultaneously removing and monitoring the removal of a metallic contaminant from the surface of a metallic workpiece is disclosed. The workpiece and a reference electrode are immersed in an electrically conductive cleaning solution. The potential difference between the workpiece and the reference electrode is periodically measured to generate a series of potential difference values. Differences between successive potential difference values of the series are quantified to generate a noise parameter value. The noise parameter value is compared to a reference value, wherein the reference value is indicative of a maximum allowable amount of contaminant, to determine if an amount of contaminant greater than the maximum allowable amount of contaminant is present on the surface of the workpiece.


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