The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 05, 1989

Filed:

May. 06, 1988
Applicant:
Inventor:

Winston K Chan, Fair Haven, NJ (US);

Assignee:

Bell Communications Research, Inc., Livingston, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430321 ; 430323 ; 430326 ; 430329 ; 430394 ; 430328 ;
Abstract

Image reversal is controlled to occur in lithographically defined regions of a positive photoresist. In that way, selective reversal of a simple holographic grating is achieved to obtain 180-degree phase shifts within lighographically defined regions of the grating. Such a phase-shifted grating is useful, for example, to provide distributed feedback in a semiconductor laser designed for single-longitudinal-mode operation.


Find Patent Forward Citations

Chan, Winston. (1989). Phase-shifted gratings by selective image reversal of photoresist (U.S. Patent No. 4885231). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4885231

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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