The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 21, 1989

Filed:

Dec. 17, 1987
Applicant:
Inventor:

Sidney Braginsky, Dix Hills, NY (US);

Assignee:

Primary Systems Corporation, Danbury, CT (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B65H / ;
U.S. Cl.
CPC ...
414225 ; 29720 ; 209546 ; 209581 ; 382-8 ; 382 46 ; 901 47 ;
Abstract

An apparatus for inspecting semiconductor, or other types of, wafers is disclosed. The apparatus uses a robot arm to move wafers from an incoming location to an inspection location, and then to an outgoing location. The robot arm may be supported on a floating platform to prevent mechanical chafing and resulting contamination. The robot arm is constructed to have a free end which moves laterally, but not vertically. The arm may be retractable to reduce wobble when the wafer is being inspected. A wafer in the inspection position is inspected by scanning with an objective lens coupled to an associated optical system. If desired, an automatic discrimination system can be coupled to the optical system to permit discrimination between acceptable and non-acceptable wafers. The objective lens may face upwardly and the wafer downwardly to urge contaminants to fall from the wafer. The inspection apparatus may be mounted on a table and shielded by a housing over the table to maintain the cleanliness of the inspection environment.


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