The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 1989
Filed:
Apr. 11, 1989
Tadashi Koizumi, Tokyo, JP;
Seiji Yokota, Kanagawa, JP;
Shigeo Matsumura, Tokyo, JP;
Yoshiaki Inoue, Tokyo, JP;
Neturen Company Limited, Tokyo, JP;
Abstract
In preparing superfine particle in a reaction chamber by evaporation-in-gas method or on such processes as PVD or CVD using arc- or high-frequency plasma wherein in the proximity of the inner surface of the said reaction chamber, a vessel provided with a number of pores thereon is arranged and gas consisting of given components is introduced into the space between the inner surface of the chamber and the vessel, and spouted through the said pores on the vessel. The resultant superfine particle produced in the chamber and being in Brownian movement or in thermal migration does not adhere to the surface of the vessel by being separated from the vessel by the spouting gas so that the gas containing superfine particle is directed securely to the collecting path, wherein the vessel is made of the material not reactive with the resultant superfines but resistant to heat.