The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 1989
Filed:
Dec. 23, 1987
Applicant:
Inventors:
Assignee:
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430302 ; 430189 ; 430309 ; 430331 ; 354299 ; 354317 ; 354318 ;
Abstract
Disclosed is a method for the manufacture of a lithographic printing plate where a photosensitive lithographic printing plate precursor is imagewise exposed, a determined about of a developer is supplied to the exposed surface and the developer is the disposed of. A surfactant is added to the developer so that the surface tension of the developer is about 50 dyne/cm or less at 25.degree. C. By the addition of the surfactant, a stable and economical development of an exposed plate is possible with a small amount of the surfactant-containing developer.