The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 1989
Filed:
Dec. 21, 1987
Mitsubishi Rayon Company Limited, Tokyo, JP;
Abstract
A process for producing a low gloss thermoplastic resin which comprises polymerizing in two steps from 20 to 70 parts by weight of a butadiene polymer, at least 70% by weight of which is constituted by butadiene, with from 30 to 80 parts by weight of a total of from 15 to 40% by weight of a vinyl cyanide monomer and from 60 to 85% by weight of an aromatic vinyl monomer, characterized in that for the polymerization of the first step, the butadiene polymer, the vinyl cyanide monomer and the aromatic vinyl monomer were charged in amounts corresponding to from 20 to 80% by weight of the entire butadiene polymer, from 20 to 80% by weight of the entire vinyl cyanide monomer and from 20 to 80% by weight of the entire aromatic vinyl monomer, respectively, and after the completion of the polymerization of the first step, the rest of the butadiene polymer, the vinyl cyanide monomer and the aromatic vinyl monomer were charged for the polymerization of the second step.