The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 1989
Filed:
Jul. 24, 1987
Fujitsu Limited, Kawasaki, JP;
Abstract
A process for the production of optical elements which comprises forming on a substrate a light-sensitive film containing at least a photoreactive compound, and selectively exposing the film to radiation to cause migration of the unreacted compound from an unexposed area to an exposed area by the exposure. The present process is particularly useful in the low-cost mass-production of various micronized optical elements such as plastic microlenses and arrays thereof, optical waveguides, diffraction gratings, and holograms, for example. An optical device comprising the optical elements of the present invention is also disclosed.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile