The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 1989
Filed:
Jul. 29, 1988
Applicant:
Inventors:
Donald E Vandenberg, Brockport, NY (US);
Donald A Jacques, Pittsford, NY (US);
William E Schaffer, Spencerport, NY (US);
Assignee:
Eastman Kodak Company, Rochester, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B / ; G02B / ;
U.S. Cl.
CPC ...
350611 ; 350360 ; 350487 ;
Abstract
A method for providing corrections of distortions of a mirror. Initial corrections may be provided through the use of active optics, to apply forces to the mirror to introduce deformations that cancel out the distortions. This action, in turn, may induce undesirable aberrations. The method of the invention provides steps for identifying, isolating and removing the induced undesirable aberrations, and computing new applied forces that cannot induce the undesirable aberrations.