The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 17, 1989

Filed:

Dec. 27, 1988
Applicant:
Inventor:

David M Rakov, Irondequoit, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01D / ;
U.S. Cl.
CPC ...
346159 ; 3461531 ;
Abstract

An ion projection print head for applying ions line-by-line from a substantially uniform linear ion source, in a modulated pattern to a moving ion receptor substrate to form a latent image charge pattern on such substrate corresponding to information to be reproduced. The ion projection print head comprises a substantially planar mask having an elongated slot defined therethrough, the slot being oriented in a longitudinal direction substantially parallel to an element of the ion receptor substrate transverse to the direction of movement of such substrate. A continuous electrode is formed on the side of the mask between the mask and the ion source, and a plurality of electrodes are formed on the side of the mask opposite from the continuous electrode. The plurality of electrodes are spaced apart in insulating relationship from one another and terminate at the slot. An electrical bias is selectively applied to the plurality of electrodes respectively to modulate ion flow through the slot from the ion source to the receptor substrate.


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