The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 1989
Filed:
Feb. 26, 1988
Applicant:
Inventors:
Billy W Ward, Rockport, MA (US);
Michael L Ward, Gloucester, MA (US);
Assignee:
Micrion Corporation, Beverly, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
250309 ; 250307 ; 2504922 ; 356314 ; 156626 ;
Abstract
Ion beam machining apparatus which uses a focused ion beam to sputter particles from a target is disclosed. The beam is scanned over the target and photons emitted in response to the incidence of the beam on the target are analyzed to identify the different materials in the target and the location of these materials. Electrons are projected in a stream to the impingement site of the ion beam, in order to neutralize the charge produced by the beam and thereby stabilize the position of this site, and the photon detectors are isolated from any light emitted by the electron source.