The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 1989
Filed:
Sep. 03, 1987
Diwaker Garg, Macungie, PA (US);
Beth A Klucher, Sherman Oaks, CA (US);
Paul N Dyer, Allentown, PA (US);
Richard W Kidd, Newhall, CA (US);
Christopher Ceccarelli, Whitehall, PA (US);
Air Products and Chemicals, Inc., Allentown, PA (US);
Abstract
A method for producing the disclosed material comprises introducing into a chemical vapor deposition (CVD) reactor a mixture of process gases comprised essentially of (1) tungsten hexafluoride, (2) a volatile oxygen- and hydrogen-containing organic compound, and (3) hydrogen; controlling the ratio of the tungsten hexafluoride to the oxygen- and hydrogen-containing organic compound within the CVD reactor so that the W/C atomic ratio is within the range of about 0.5 to about 15; controlling the reaction temperature so it is within the range of above about 300.degree. to less than about 650.degree. C.; controlling the total pressure within the range of about 1 Torr. to about 1,000 Torr.; and controlling the ratio of H.sub.2 to WF.sub.6 within the range of about 4 to about 20; to produce W and W.sub.2 C, W and W.sub.3 C, or W and W.sub.2 C and W.sub.3 C.