The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 17, 1989

Filed:

Nov. 27, 1987
Applicant:
Inventors:

Kazuhiro Kobayashi, Hino, JP;

Masayuki Kurematsu, Hino, JP;

Shigeharu Koboshi, Hino, JP;

Nobutaka Goto, Hino, JP;

Naoki Takabayashi, Hino, JP;

Assignee:

KNICA Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C02F / ;
U.S. Cl.
CPC ...
210718 ; 210719 ; 210721 ; 210725 ; 210727 ; 210737 ; 210750 ; 210763 ; 210766 ; 210908 ; 210912 ; 210916 ;
Abstract

Disclosed is a method for treating a photographic processing waste solution comprising concentrating the photographic processing waste solution containing at least thiosulfate ions, characterized in that there is provided at least one part selected from (i) to (v) shown below:


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