The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 1989
Filed:
Oct. 17, 1988
Larry A Coldren, Santa Barbara, CA (US);
Jay A Skidmore, Goleta, CA (US);
The Regents of the University of California, Berkeley, CA (US);
Abstract
Anisotropic chemically enhanced etching apparatus producing extremely low surface damage during the etching process. There is an evacuated main chamber in which an etching process takes place. A temperature-controlled, tiltable stage receives and holds the substrate to be etched within the main chamber. There is a nozzle directing a flow against a substrate mounted on the stage. There is a microwave cracker connected to a supply of molecular chlorine on an input side and connected to the nozzle on an output side for exciting and disassociating the molecular chlorine to be discharged through the nozzle as chlorine radicals. A first controller is operably connected to the cracker for controlling the flow of chlorine radicals being emitted from the nozzle. There is an ion gun for controlling the beam of ions. The second controller includes a feedback signal.