The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 1989
Filed:
Oct. 25, 1988
Anthony Juliana, San Jose, CA (US);
Wai C Leung, San Jose, CA (US);
Victor T Pan, Fremont, CA (US);
Hal J Rosen, Los Gatos, CA (US);
Timothy C Strand, San Jose, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method for optically measuring at least one characteristic of a thin film on a reflecting substrate. A p-polarized beam of collimated light of known intensity is directed through an integrating sphere onto the film at substantially the Brewster's angle of the film. All the light is reflected into the sphere, including all diffusely reflected light as well as the light specularly reflected at a region inside the sphere where the specularly reflected light is incident. A reflective surface is provided for determining the thickness of the film as a function of the total intensity of light sensed within the sphere. An absorptive surface is provided at said region for absorbing the specularly reflected light for determining the porosity or surface roughness of the film based on the intensity of the diffused light sensed within the sphere not reflected from the substrate.