The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 1989
Filed:
Aug. 06, 1987
Hiroshi Nishinoiri, Nagaokakyo, JP;
Masahiko Saikawa, Nagaokakyo, JP;
Yoshikazu Takaya, Nagaokakyo, JP;
Euji Kanada, Nagaokakyo, JP;
Mitsubishi Paper Mills, Ltd., Tokyo, JP;
Abstract
There is provided a method for making a lithographic printing plate having high sensitivity, resolving power and printing endurance and free from scumming utilizing silver complex diffusion transfer process which comprises subjecting to scanning exposure of high-intensity short-time a light sensitive material comprising a support and, provided thereon, at least a silver halide emulsion layer and a physical development nuclei layer as a surface layer and then developing it with a silver complex diffusion transfer developer, the improvement which comprises subjecting the light sensitive material to imagewise exposure with scanning light of at least 700 nm, said emulsion layer containing silver halide grains mainly composed of silver chloride and a sensitizing dye having a sensitivity maximum in the long wavelength region of at least 700 nm in an amount of 3.times.10.sup.-5 -3.times.10.sup.-4 mol for 1 mol of silver halide and an antihalation means being provided below said emulsion layer to provide a reflectance of 13-40% for the scanning exposure light of at least 700 nm.