The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 1989
Filed:
Mar. 31, 1987
Takao Senga, Nagaokakyo, JP;
Kazuchiyo Takaoka, Nagaokakyo, JP;
Hirokazu Yamamoto, Nagaokakyo, JP;
Takimi Hashimoto, Nagaokakyo, JP;
Mitsubishi Paper Mills, Ltd., Tokyo, JP;
Abstract
Disclosed is a process for producing a liquid developer for electrostatic photography which comprises a highly insulating hydrocarbon medium and resin particles dispersed therein, said process comprising polymerizing a monomer (A) soluble in said medium, but insolubilized upon being polymerized in the presence of a polymer (S) insoluble in said medium and having a carboxyl group, a hydroxyl group or an amide group. In this process, a monomer (B) soluble in said medium and still soluble upon being polymerization and/or a monomer (C) having at least two polymerizable unsaturated double bonds may also be polyumerized.