The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 1989
Filed:
Dec. 23, 1987
Applicant:
Inventors:
Takeo Itou, Fukaya, JP;
Hidemi Matsuda, Oomiya, JP;
Mamoru Yoshizako, Tokyo, JP;
Osamu Yagi, Kawasaki, JP;
Assignees:
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Tama Chemicals Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427 64 ; 427108 ; 427165 ; 427226 ;
Abstract
According to the invention, an antistatic/anti-reflecting film of high adhesive strength can be formed easily by forming an SiO.sub.2 film on a cathode-ray tube faceplate by means of a condensation reaction of polyalkyl siloxane consisting essentially of condensed alkyl silicates. As a result, the sintering conditions for forming an antistatic/anti-reflecting film can be set adequately. The antistatic effect can be further enhanced, reflection of the external light can be decreased, and workability can be greatly improved.