The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 10, 1989

Filed:

Mar. 03, 1983
Applicant:
Inventors:

Mitsuo Kinoshita, Hitachi, JP;

Tetsuo Ito, Hitachi, JP;

Hiroji Mikawa, Ibaraki, JP;

Koichi Chino, Hitachi, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D / ;
U.S. Cl.
CPC ...
159-62 ; 159 44 ; 159 49 ;
Abstract

Disclosed is a control system for a centrifugal thin film dryer wherein a slurry including solid matter is fed to a tubular heating surface and the a slurry is heated while blades are rotating inside the heating tube so that the a slurry turns into dry powder, the system comprising a plurality of thermal sensors located on the heating surface, a dry-up point calculator which measures the temperature distribution along the heating surface in accordance with the signals provided by the thermal sensors and calculates the point at which the temperature rise begins to saturate, a flow rate setting device which calculates the quantity of a slurry to be supplied in accordance with the output of the dry-up point calculator, and a flow rate regulator which controls a pump in accordance with the signal provided by the flow rate setting device.


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