The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 1989
Filed:
Sep. 15, 1987
Zehev Tadmor, Teaneck, NJ (US);
Arthur D Siegel, Cheshire, CT (US);
Jan-Chin Yang, Pittsford, NY (US);
Other;
Abstract
A rotary processor for high-shear processing of plastic or polymeric materials comprises a rotor having end discs and at least one mixing disc therebetween, the rotor closely surrounded by a housing to defined annular processing chambers flanking each mixing disc, with a high-shear-mixing transfer gap defined between the mixing disc and the housing. Channel blocks are deployed at circumferentially spaced apart positions in adjacent chambers to cause transfer of material through the transfer gaps, with dispersive mixing occurring in the transfer gaps. Some embodiments have plural channel blocks in the chambers, evenly spaced apart. The channel blocks extend generally into and to the bottom of a chamber, and have two working surfaces divergent from a central region of the chamber and convergent toward the disc walls defining the chamber. The working surfaces and disc walls defined two high-shear-mixing recycle gaps through which a portion of the material passes and is mixed. The channel block configuration is also used in a single chamber rotary processor.