The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 26, 1989
Filed:
Dec. 09, 1987
Gunter Schmahl, Gottingen, DE;
Dietbert Rudolph, Nordheim, DE;
Carl-Zeiss-Stiftung, Heidenheim/Brenz, DE;
Abstract
An x-ray microscope in which the object is illuminated coherently or partially coherently via a condenser with quasi-monochromatic x-radiation and is imaged enlarged in the image plane by a high resolution x-ray objective. To obtain the highest possible image contrast, there is arranged in the Fourier plane of the x-ray objective an element which imparts a phase shift to a preselected order of diffraction of the radiation. The element extends over the surface region in the Fourier plane which is acted on here by the diffracted radiation to be influenced. The utilization of the phase shift of a preselected order of diffraction of the radiation as compared with the uninfluenced radiation makes it possible to carry out examinations, in particular of biological structures, with a low dose of radiation and nevertheless to produce a high image contrast. Moreover, it is possible to shift the wavelength region of the x-ray radiation to be used toward shorter wavelengths at which, as a result of the lesser absorption, x-ray microscopy was not meaningfully possible heretofore.