The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 26, 1989
Filed:
Jul. 29, 1988
Hiroaki Tobuse, Hyogo, JP;
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
An electron beam direct drawing device for use in manufacturing a printed circuit board having a photoresist thereon according to a drawing pattern information obtained by a computer aided printed circuit board pattern design, comprises means for dividing the drawing pattern information over a whole area of the printed circuit board into a plurality of fields each capable of being scanned by electron beam and for re-editing drawing patterns of the respective fields, means for storing the divided and then re-edited drawing pattern information, means for generating a first control signal for reading out the stored drawing pattern information sequentially and performing a main deflection of electron beam by means of a main deflector and means for generating a second control signal for deriving, from the stored drawing pattern information, information assigning an orientation of a pattern to be drawn and a scan width of a sub-deflection and for performing a predetermined sub-deflection scanning by means of a sub-deflector, whereby electron beam scans the printed circuit board under a control of a combination of the main deflection and the sub-deflection. A clock generator capable of producing a plurality of clock signals each corresponding to a specific line width of the pattern is provided to expose the line with electron beam of optimum dose.