The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 26, 1989

Filed:

May. 27, 1988
Applicant:
Inventors:

Madhu Bhatnagar, Canton, MI (US);

Ronald E Opfer, Jr, Milford, MI (US);

Assignee:

Holcroft/Loftus, Inc., Livonia, MI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J / ;
U.S. Cl.
CPC ...
4819 / ; 4819 / ; 48DI / ; 422111 ; 422112 ;
Abstract

An improved gas generator in which the composition of gas generated in a heated reactor is maintained when the flow rate from the reactor is adjusted. To accomplish this, the generator includes two diverting means responsive to the flow rate. The first diverts a portion of the reactant mixture before it enters the reactor, the diverted amount being insufficient to change the composition of the generated gas. The second diverts a portion of the generated gas to a burner for heating the reactor.


Find Patent Forward Citations

Bhatnagar, Madhu. (1989). Endothermic gas generator (U.S. Patent No. 4869730). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4869730

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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