The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 1989
Filed:
Mar. 04, 1988
Toshiba Machine Co., Ltd., Tokyo, JP;
Abstract
In a system for continuously exposing desired patterns and their backgrounds on the surface of a target, a first electron beam emitted from a first electron gun is converged by condenser lenses and an objective lens to be focused on the surface of the target. A second electron beam emitted from a second electron gun is defocused at the target surface by a condenser lens and a deflecting coil. A deflector selects the first or second electron beams. While the target surface is being scanned with the selected electron beam, the beam is deflected by a scanning deflector. In delineating a pattern, the target surface is scanned with the first electron beam. In delineating a background, on the other hand, the target surface is scanned with the second electron beam.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile