The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 1989
Filed:
May. 09, 1988
Applicant:
Inventors:
John Keem, Bloomfield Hills, MI (US);
Jun S Im, Detroit, MI (US);
John Tyler, Grosse Pointe Park, MI (US);
Richard Bergeron, Romulus, MI (US);
Kevin Dennis, Detroit, MI (US);
David Hoeft, Clawson, MI (US);
Assignee:
Ovonic Synthetic Materials Company, Inc., Troy, MI (US);
Primary Examiner:
Int. Cl.
CPC ...
H01F / ;
U.S. Cl.
CPC ...
75 / ; 75 / ; 148403 ;
Abstract
Disclosed is a controlled pressure melt spinning method of rapidly solidifying alloys to obtain a solid alloy of controlled mean crystallite size, narrow crystallite distribution, and a fine grain microstructure.
Quick Actions:
Keem, John. (1989). Method of forming alloy particulates having controlled submicron (U.S. Patent No. 4867785). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4867785
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile