The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 19, 1989

Filed:

Oct. 02, 1986
Applicant:
Inventor:

Valere Duchenois, Paris, FR;

Assignee:

U.S. Philips Corporation, New York, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B / ; H04N / ;
U.S. Cl.
CPC ...
350321 ; 350-12 ; 3134 / ; 358 67 ; 365217 ;
Abstract

An exposure arrangement for use in a computer-aided design system to produce masks. The arrangement includes a cathode-ray tube which produces an image of the mask on the screen of the tube, and an optical system which projects the image of the mask onto a substrate which is to be exposed. The cathode-ray tube is a high-brightness tube in which the screen is provided with a phosphor which emits in an ultraviolet spectrum and with a cooling circuit for the phosphor. The optical system is designed for use in the ultraviolet spectrum and operates on the ultraviolet image provided by the screen of the high-brightness tube.


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Duchenois, Valere. (1989). Exposure arrangement for the production of masks (U.S. Patent No. 4867535). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4867535

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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