The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 1989
Filed:
Sep. 10, 1987
Takayasu Mochizuki, Tokyo, JP;
Chiyoe Yamanaka, Ashiya-shi, Hyogo-ken, JP;
Hoya Corp., Tokyo, JP;
Other;
Abstract
In a laser plasma X-ray device for use in generating X-rays by bombarding a target material by a pulsed laser beam, the target material is selected from materials which are in a gas phase at the room temperature and which are cooled in a selected one of liquid and solid phases. Such a selected phase of the target material is continuously supplied to a focal point of the pulsed laser beam to be subjected to bombardment and to generate the X-rays. On generation of the X-rays, the target material is rendered into the gas phase to be recycled into the selected phase. The X-rays are guided outside of the chamber through an X-ray gate unit opened in synchronism with a repetition frequency of the pulsed laser beam.